Wei-Chao Chiu

Title: Innovations of Wei-Chao Chiu

Introduction

Wei-Chao Chiu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on advanced techniques that enhance the performance and reliability of semiconductor devices.

Latest Patents

One of Wei-Chao Chiu's latest patents involves techniques for forming a deep trench isolation structure between photodiodes. This innovation utilizes double patterning techniques to reduce corner rounding, etch loading, and other defects that may arise during the formation of a deep trench isolation (DTI) structure in a pixel array. The process includes forming a first set of trenches in one direction and a second set in another direction, ensuring minimal to no etch loading and corner rounding at the intersections of the trenches. Another notable patent pertains to implantation mask formation techniques. This method increases the initial aspect ratio of a pattern in an implantation mask through non-lithography techniques. By forming a resist hardening layer on the implantation mask, the height of the pattern is increased while the width is reduced, resulting in an ultra-high aspect ratio that minimizes the likelihood of pattern collapse during formation.

Career Highlights

Wei-Chao Chiu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have significantly contributed to the company's advancements in semiconductor manufacturing.

Collaborations

Throughout his career, Wei-Chao Chiu has collaborated with notable colleagues, including Feng-Jia Shiu and Ching-Sen Kuo. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Wei-Chao Chiu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in the industry, showcasing the importance of innovation in technology.