Miyagi, Japan

Wataru Takayama

This inventor holds 7 USPTO granted patents and 4 published patent applications and 1 EPO patent. Top assignees: Tokyo Electron Limited, Tokyo Electron Limi Ted. Active years: 2016-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wataru Takayama. Retrieved from https://idiyas.com/inventor/wataru-takayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 85.7

 

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 90(Granted Patents)


Company Filing History:


Years Active: 2016-2020

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7 patents (USPTO):Explore Patents

Title: Wataru Takayama: Innovator in Plasma Processing Technologies

Introduction

Wataru Takayama is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing, holding a total of 7 patents. His innovative approaches have advanced the technology used in various applications, particularly in semiconductor manufacturing.

Latest Patents

Takayama's latest patents include a plasma processing method and a plasma processing apparatus. The plasma processing method involves plasma-processing a substrate placed on a surface of a placement table while causing a coolant of 0°C or lower to flow through a coolant flow path formed inside the table. This method also includes placing a dummy substrate on the surface of the placement table in place of the substrate and removing a reaction product generated due to the plasma processing of the substrate. This is achieved while heating the surface of the placement table by the plasma of the processing gas via the dummy substrate.

Another notable patent is the plasma etching method, which consists of a first process that generates a first plasma from a first processing gas containing fluorine and hydrogen. This plasma is used to etch a laminated film that includes different silicon-containing film layers. The second process generates a second plasma from a bromine-containing gas to further etch the laminated film, ensuring that any unevenness formed during the first process is removed.

Career Highlights

Throughout his career, Wataru Takayama has worked with notable companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field of plasma processing.

Collaborations

Takayama has collaborated with several talented individuals in his field, including Sho Tominaga and Yoshiki Igarashi. These collaborations have fostered innovation and have led to the development of advanced technologies.

Conclusion

Wataru Takayama's contributions to plasma processing technologies have made a significant impact in the industry. His innovative patents and collaborations with other experts highlight his dedication to advancing technology in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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