Albany, NY, United States of America

Wan Jae Park

This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2020-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wan Jae Park. Retrieved from https://idiyas.com/inventor/wan-jae-park-ix7yaq3r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2020-2022

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2 patents (USPTO):Explore Patents

Title: Innovations by Wan Jae Park

Introduction

Wan Jae Park is an accomplished inventor based in Albany, NY (US). He has made significant contributions to the field of photoresist technology, holding 2 patents that focus on improving the performance of photoresist layers used in semiconductor manufacturing.

Latest Patents

His latest patents include a plasma treatment method designed to improve photo resist roughness and remove photo resist scum. This method involves treating a patterned photo resist layer, such as an EUV photo resist layer, with plasma before etching processes. The treatment effectively reduces line width roughness (LWR), line edge roughness (LER), and photo resist scum. The plasma treatment may utilize gases containing boron and halogen compounds, such as boron trichloride (BCl) or boron fluoride (BF), to enhance the photoresist surface.

Another notable patent is related to the selective atomic layer deposition (ALD) of protective caps to enhance extreme ultra-violet (EUV) etch resistance. This method selectively deposits a protective material on the top regions of patterned photoresist layers, providing a cap that minimizes erosion damage during etching. The selective deposition can be achieved through high-rotation speeds in spatial atomic layer deposition techniques, increasing the flexibility of options to improve etch resistance.

Career Highlights

Wan Jae Park is currently employed at Tokyo Electron Limited, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of photoresist materials, which are critical for the manufacturing of integrated circuits.

Collaborations

He collaborates with talented individuals such as Soo Doo Chae and Akiteru Ko, contributing to a dynamic team focused on cutting-edge research and development.

Conclusion

Wan Jae Park's contributions to the field of photoresist technology through his innovative patents demonstrate his expertise and commitment to advancing semiconductor manufacturing processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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