Wan-Fang Chung

Title: Innovations of Wan-Fang Chung

Introduction

Wan-Fang Chung is a notable inventor based in Chiayi, Taiwan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his expertise and innovative spirit. His work focuses on methods for fabricating semiconductor devices, which are crucial for the advancement of electronic components.

Latest Patents

Wan-Fang Chung's latest patents include a method for fabricating semiconductor devices. This method utilizes two hard masks to define the widths of the first and second gates, ensuring precise control over their dimensions. The select gate's width can be adjusted in advance, and it is protected during the etching process, resulting in a semiconductor device that maintains excellent performance even as it is miniaturized. Another patent describes a semiconductor device that features a first gate structure and a second gate structure adjacent to each other, separated by a spacer. The fabrication method involves etching through a first hard mask to create a transient first gate structure and a temporary gate structure, ultimately leading to the formation of the first gate structure.

Career Highlights

Wan-Fang Chung is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work there has allowed him to develop innovative solutions that enhance the performance and efficiency of semiconductor devices.

Collaborations

He has collaborated with notable coworkers, including Hsiang-Chen Lee and Ping-Chia Shih, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Wan-Fang Chung's contributions to semiconductor fabrication methods highlight his role as an influential inventor in the field. His innovative patents and collaborations reflect his commitment to advancing technology and improving device performance.