Location History:
- El Paso, TX (US) (1980)
- Ilion, NY (US) (1992 - 1993)
- San Jose, CA (US) (1996)
- Downers Grove, IL (US) (2007 - 2011)
- Rocklin, CA (US) (2020)
Company Filing History:
2 out of 1,156 
2 out of 1,787 
1 out of 50 
Years Active: 1980-2020
Title: Walter F Johnson: Innovator in Metal Film Thickness Measurement
Introduction
Walter F Johnson is a notable inventor based in Ilion, NY (US), recognized for his contributions to the field of metal film thickness measurement. He holds a total of 8 patents, showcasing his innovative spirit and technical expertise.
Latest Patents
One of Johnson's latest patents is focused on the dynamic determination of metal film thickness from sheet resistance and temperature coefficient of resistivity (TCR) value. This invention allows for the accurate measurement of metal film thickness by utilizing sheet resistance, resistivity, and TCR. The method effectively reduces or eliminates variations in film thickness measurements caused by resistivity. A probe head is employed for some measurements, which may include a temperature sensor during sheet resistance assessments. Additionally, a wafer on a chuck is heated, either by the chuck or the probe head, to facilitate these measurements.
Career Highlights
Throughout his career, Johnson has worked with various companies, including General Instrument Corporation. His work has significantly impacted the field of materials science and engineering, particularly in the area of electronic components.
Collaborations
Johnson has collaborated with notable individuals such as Aaron M Smith and Jeffrey T Eschbach, contributing to advancements in his field through teamwork and shared expertise.
Conclusion
Walter F Johnson's innovative work in metal film thickness measurement has made a lasting impact on the industry. His patents reflect a commitment to improving measurement techniques and enhancing the accuracy of electronic components.