Waki Ohkubo

Title: Waki Ohkubo: Innovator in Positive Resist Composition

Introduction

Waki Ohkubo is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist compositions, particularly in the development of positive resist materials used in photolithography.

Latest Patents

Waki Ohkubo holds 5 patents related to his innovative work. His latest patents include a positive resist composition and a method for forming a resist pattern. This composition enables the creation of resist patterns with excellent shape. The resist composition consists of a resin component that exhibits increased alkali solubility under the action of acid, an acid-generator component that generates acid upon irradiation, and an organic solvent in which these components are dissolved. The resin component includes a copolymer with specific structural units that enhance its performance in resist applications.

Career Highlights

Throughout his career, Waki Ohkubo has worked with prominent companies in the industry. He has been associated with Tokyo Ohka Kogyo Co., Ltd. and Daito Chemix Corporation, where he has contributed to advancements in resist technology.

Collaborations

Waki Ohkubo has collaborated with notable colleagues, including Hiroto Yukawa and Kouki Tamura. Their combined expertise has furthered the development of innovative solutions in the field of resist compositions.

Conclusion

Waki Ohkubo's contributions to the field of positive resist compositions have established him as a key figure in the industry. His innovative patents and collaborations continue to influence advancements in photolithography.