The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Apr. 18, 2006
Yohei Kinoshita, Kanagawa-ken, JP;
Waki Ohkubo, Kanagawa-ken, JP;
Yusuke Nakagawa, Kanagawa-ken, JP;
Shinichi Hidesaka, Kanagawa-ken, JP;
Makiko Irie, Kanagawa-ken, JP;
Yohei Kinoshita, Kanagawa-ken, JP;
Waki Ohkubo, Kanagawa-ken, JP;
Yusuke Nakagawa, Kanagawa-ken, JP;
Shinichi Hidesaka, Kanagawa-ken, JP;
Makiko Irie, Kanagawa-ken, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
The present invention is a positive resist composition and a resist pattern forming method including a resin component (A) which has a polymer compound (A1) having a structural units (a1) including an acetal type acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, and an acid generator component (B) having an onium salt-based acid generator (B1) having a cation portion represented by a general formula (b-1) shown below [wherein, Rrepresents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; Rto Reach represents, independently, an aryl group or the alkyl group that may have substituent group; n' represents either 0 or an integer from 1 to 3].