Location History:
- Yamanashi, JP (2004 - 2007)
- Nirasaki, JP (2011)
Company Filing History:
Years Active: 2004-2011
Title: Wakako Naito: Innovator in Plasma Etching Technology
Introduction
Wakako Naito is a prominent inventor based in Yamanashi, Japan. She has made significant contributions to the field of plasma etching technology, holding a total of 3 patents. Her work focuses on advanced methods that enhance the efficiency and effectiveness of plasma processing.
Latest Patents
Wakako Naito's latest patents include a plasma etching method and a computer-readable storage medium. The plasma etching method involves a process for plasma-etching an anti-reflective coating on a target object. This method includes placing the target object into a processing chamber equipped with a first and second electrode. The target object consists of an etching target film, an anti-reflective coating, and a patterned photoresist film. The process further involves introducing a processing gas into the chamber, generating plasma by applying high-frequency power, and applying a DC voltage to one of the electrodes.
Another notable patent is the etching method and plasma processing method. In this method, a processing gas composed of CHF, O, and Ar is introduced into a plasma processing apparatus. The flow rate ratio of the gas constituents is set at CHF/O/Ar=20 sccm/10 sccm/100 sccm, with the pressure inside the chamber maintained at 50 mTorr. A high-frequency power of 500 W at a frequency of 13.56 MHz is applied to a lower electrode, where a wafer is placed. This process effectively etches an SiN layer formed on a Cu layer while minimizing oxidation.
Career Highlights
Wakako Naito is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. Her innovative work in plasma etching has positioned her as a key figure in advancing semiconductor technology.
Collaborations
Wakako collaborates with notable colleagues such as Masaaki Hagihara and Koichiro Inazawa, contributing to a dynamic team focused on cutting-edge research and development in plasma processing.
Conclusion
Wakako Naito's contributions to plasma etching technology exemplify her dedication to innovation in the semiconductor field. Her patents reflect her expertise and commitment to advancing technology, making her a significant figure in her industry.