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For the Inventor, By the Inventor

Marblehead, MA, United States of America

Wade Krull

This inventor holds 17 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in Ion Implantation Technology. Top assignees: Semequip, Inc., Eaton Corporation, Entegris, Inc.. Active years: 1999-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wade Krull. Retrieved from https://idiyas.com/inventor/wade-krull

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 

% Patents Active = 11.8

 

Average Co-Inventor Count = 3.1

ph-index = 9

Forward Citations = 303(Granted Patents)


Company Filing History:

goldMedal15 out of 53 
 
Semequip, Inc.
 patents
silverMedal1 out of 5,989 
 
Eaton Corporation
 patents
bronzeMedal1 out of 841 
 
Entegris, Inc.
 patents

Years Active: 1999-2019

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Areas of Expertise:
Electrostatic Chuck
Semiconductor Devices
Carbon Clusters
Ion Extraction
CMOS Devices
Defect Engineering
Equipment Uptime
Ion Dosage Measurement
Ion Beam Implanter
Control Method
Ion Implantation
Cluster Ion Implantation
17 patents (USPTO):Explore Patents
1. 10497598 - Electrostatic chuck and method of making same (2019-12-03),
2. 8530343 - System and method for the manufacture of semiconductor devices by the implantation of carbon clusters (2013-09-10),
3. 8368309 - Method and apparatus for extracting ions from an ion source for use in ion implantation (2013-02-05),
4. 8236675 - Semiconductor device and method of fabricating a semiconductor device (2012-08-07),
5. 8097529 - System and method for the manufacture of semiconductor devices by the implantation of carbon clusters (2012-01-17),
6. 7994031 - Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions (2011-08-09),
7. 7919402 - Cluster ion implantation for defect engineering (2011-04-05),
8. 7820981 - Method and apparatus for extending equipment uptime in ion implantation (2010-10-26),
9. 7791047 - Method and apparatus for extracting ions from an ion source for use in ion implantation (2010-09-07),
10. 7723233 - Semiconductor device and method of fabricating a semiconductor device (2010-05-25),
11. 7666771 - System and method for the manufacture of semiconductor devices by the implantation of carbon clusters (2010-02-23),
12. 7629590 - Method and apparatus for extending equipment uptime in ion implantation (2009-12-08),
13. 7609003 - Ion implantation system and control method (2009-10-27),
14. 7528550 - Ion implantation system and control method (2009-05-05),
15. 7394202 - Ion implantation system and control method (2008-07-01),

Title: The Innovative Journey of Wade Krull

Introduction: Wade Krull, a talented inventor hailing from Marblehead, MA (US), has made significant contributions to the world of innovations with his creative mind and dedication to problem-solving.

Latest Patents: Wade Krull holds several patents in various fields, including technology, healthcare, and consumer products. His most recent patent involves a groundbreaking design for a sustainable packaging solution that aims to reduce environmental impact.

Career Highlights: Throughout his career, Wade Krull has demonstrated a keen ability to identify gaps in the market and develop innovative solutions to address them. His work has not only improved existing products but has also led to the creation of entirely new technologies that have positively impacted industries worldwide.

Collaborations: Wade Krull is known for his collaborative spirit, often partnering with other inventors, researchers, and industry experts to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many of his projects.

Conclusion: Wade Krull's passion for innovation, coupled with his relentless drive to push the boundaries of what is possible, has established him as a respected figure in the world of inventors. His contributions continue to inspire future generations of innovators to think outside the box and create solutions that make a difference.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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