Geneva, IL, United States of America

Vlasta Brusic Kaufman

This inventor holds 23 USPTO granted patents and 2 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Cabot Microelectronics Corporation, Cabot Corporation, Other. Active years: 1998-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vlasta Brusic Kaufman. Retrieved from https://idiyas.com/inventor/vlasta-brusic-kaufman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.7

ph-index = 14

Forward Citations = 834(Granted Patents)


Company Filing History:


Years Active: 1998-2008

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Areas of Expertise:
Chemical Mechanical Polishing
Copper Substrates
Polishing Slurry
Multi-Layer Substrate
Oxidizer-Based CMP
Polishing Systems
Stopping Compound
Rare Earth Salt
Multi-Oxidizer Slurry
Copper/Tantalum Substrates
CMP Methods
Metal Layers
23 patents (USPTO):Explore Patents

Title: Vlasta Brusic Kaufman: Innovator in Chemical Mechanical Polishing

Introduction

Vlasta Brusic Kaufman, based in Geneva, Illinois, is a notable inventor with an impressive portfolio of 23 patents. His work primarily focuses on chemical mechanical polishing technology, which has significant applications in various industries, particularly in semiconductor manufacturing.

Latest Patents

Kaufman's recent patents include an innovative chemical mechanical polishing slurry tailored for copper substrates. This slurry incorporates an oxidizing agent, a complexing agent, and an abrasive, with the possibility of an optional surfactant. Notably, it does not require a separate film-forming agent, making it highly efficient for removing layers of copper alloy, titanium, titanium nitride, tantalum, and tantalum nitride from substrates. Additionally, he has developed chemical mechanical polishing systems and methods that utilize alpha-amino acid containing compositions and slurries, effective for polishing metal and dielectric layers in various substrates.

Career Highlights

His career includes valuable contributions to prominent companies such as Cabot Microelectronics Corporation and Cabot Corporation, where he honed his expertise in the field of chemical mechanical polishing. Through his work, he has advanced the technology that is crucial for achieving precision in semiconductor devices.

Collaborations

Throughout his career, Kaufman has collaborated with esteemed professionals including Shumin Wang and Rodney C. Kistler. These collaborations have further enriched his research and development endeavors, leading to significant innovations in the polishing techniques used in the semiconductor industry.

Conclusion

Vlasta Brusic Kaufman's dedication to innovation in chemical mechanical polishing has made a notable impact on the field. His patents reflect a deep understanding of materials and processes vital for modern manufacturing, establishing him as a key player in advancing technology for future applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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