The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2003
Filed:
May. 14, 2002
Applicant:
Inventors:
Vlasta Brusic Kaufman, Geneva, IL (US);
Rodney C. Kistler, St. Charles, IL (US);
Slumin Wang, Naperville, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 2/700 ; B24D 3/02 ;
U.S. Cl.
CPC ...
B24B 2/700 ; B24D 3/02 ;
Abstract
A chemical mechanical polishing slurry comprising an oxidizing agent, a complexing agent, an abrasive, and an optional surfactant, as well as a method for using the chemical mechanical polishing slurry to remove copper alloy, titanium, titanium nitride, tantalum and tantalum nitride containing layers from a substrate. The slurry does not include a separate film-forming agent.