Naperville, IL, United States of America

Slumin Wang

This inventor holds 1 USPTO granted patent. Top assignee: Cabot Microelectronics Corporation. Active years: 2003.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 44(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovations of Slumin Wang

Introduction

Slumin Wang is a notable inventor based in Naperville, IL (US). He has made significant contributions to the field of chemical engineering, particularly in the development of advanced materials for semiconductor manufacturing. His innovative work has led to the creation of a unique chemical mechanical polishing slurry that is essential for the processing of copper substrates.

Latest Patents

Wang holds 1 patent for his invention titled "Chemical mechanical polishing slurry useful for copper substrates." This patent describes a chemical mechanical polishing slurry that comprises an oxidizing agent, a complexing agent, an abrasive, and an optional surfactant. The method outlined in the patent is designed to effectively remove layers containing copper alloy, titanium, titanium nitride, tantalum, and tantalum nitride from a substrate. Notably, the slurry does not include a separate film-forming agent, which distinguishes it from other products in the market.

Career Highlights

Slumin Wang is currently employed at Cabot Microelectronics Corporation, a leading company in the field of advanced materials for semiconductor applications. His role at the company has allowed him to focus on developing innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Wang has collaborated with several esteemed colleagues, including Rodney C. Kistler and Vlasta Brusic Kaufman. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology in their field.

Conclusion

Slumin Wang's contributions to the field of chemical engineering and semiconductor manufacturing are noteworthy. His innovative patent for a chemical mechanical polishing slurry exemplifies his commitment to advancing technology in this critical industry. Wang's work continues to influence the development of materials that are essential for modern electronics.

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