The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Dec. 19, 2002
Applicants:
Shumin Wang, Naperville, IL (US);
Vlasta Brusic Kaufman, Geneva, IL (US);
Inventors:
Shumin Wang, Naperville, IL (US);
Vlasta Brusic Kaufman, Geneva, IL (US);
Assignee:
Cabot microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 302 ; C09C 168 ; C09K 314 ;
U.S. Cl.
CPC ...
Abstract
Alpha-amino acid containing chemical mechanical polishing compositions and slurries that are useful for polishing substrates including multiple layers of metals, or metals and dielectrics.
Wang, Shumin. (2005). Chemical mechanical polishing systems and methods for their use (U.S. Patent No. 6840971). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6840971
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile