Company Filing History:
Years Active: 1998-2008
Title: Innovations and Contributions of Shumin Wang in Chemical Mechanical Polishing
Introduction: Shumin Wang, a prominent inventor based in Naperville, IL, has made significant strides in the field of chemical mechanical polishing (CMP) with a commendable portfolio of 38 patents. His innovative work is pivotal in enhancing the efficiency and effectiveness of polishing processes used in semiconductor manufacturing.
Latest Patents: Among Wang's notable patents is a formulation for a chemical mechanical polishing slurry that is specifically designed for copper substrates. This innovative slurry includes an oxidizing agent, a complexing agent, an abrasive, and an optional surfactant. Notably, it does not require a separate film-forming agent, streamlining the polishing process. Additionally, he has contributed to the development of new chemical mechanical polishing systems, which incorporate alpha-amino acid based compositions that are effective for polishing substrates with multiple layers of metals or a combination of metals and dielectrics.
Career Highlights: Throughout his career, Shumin Wang has been associated with reputable companies such as Cabot Microelectronics Corporation and Cabot Corporation. His dedication and expertise have significantly impacted the advancements in CMP technologies and their applications in the semiconductor industry.
Collaborations: Wang has collaborated with esteemed colleagues, including Vlasta Brusic Kaufman and Rodney C Kistler, contributing to a rich tapestry of knowledge and innovation within his field. These partnerships have fostered the creation of effective polishing solutions that address complex challenges in materials processing.
Conclusion: Shumin Wang's extensive patent portfolio and collaborative efforts showcase his vital role in the evolution of chemical mechanical polishing technologies. His contributions not only enhance the capabilities of semiconductor manufacturing but also position him as a leader in the innovation landscape. Wang's commitment to research and progress continues to inspire future developments in this critical area.
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