The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2006
Filed:
Jul. 19, 2002
Jian Zhang, Aurora, IL (US);
Fred Sun, Naperville, IL (US);
Shumin Wang, Naperville, IL (US);
Isaac K. Cherian, Aurora, IL (US);
Eric H. Klingenberg, Emmaus, PA (US);
Jian Zhang, Aurora, IL (US);
Fred Sun, Naperville, IL (US);
Shumin Wang, Naperville, IL (US);
Isaac K. Cherian, Aurora, IL (US);
Eric H. Klingenberg, Emmaus, PA (US);
Cabot Microelectronics Corporation, Aurora, IL (US);
Abstract
The invention provides a method of polishing a substrate comprising (i) contacting a substrate with a polishing system comprising (a) an abrasive, a polishing pad, a means for oxidizing a substrate, or any combination thereof, (b) a conducting polymer having an electrical conductivity of about 10S/cm to about 10S/cm, and (c) a liquid carrier, and (ii) abrading or removing at least a portion of the substrate to polish the substrate.