Location History:
- Haemek, IL (2015)
- Migdal Haemek, IL (2017 - 2020)
Company Filing History:
3 out of 1,405 
3 out of 83 Years Active: 2015-2020
Title: Vladimir Kruglyakov: Innovator in Extreme Ultraviolet Lithography
Introduction
Vladimir Kruglyakov, an accomplished inventor based in Migdal Haemek, Israel, has made significant contributions to the field of photolithography. With a remarkable portfolio that includes four patents, Kruglyakov has focused on advancing the technology involved in extreme ultraviolet (EUV) lithography processes, which are critical to the semiconductor manufacturing industry.
Latest Patents
Among his latest innovations is a patented method for correcting critical dimension (CD) variations in extreme ultraviolet lithography. This method involves mapping the CD variation of a wafer exposure field created by a photolithography system utilizing an EUV photolithography photomask. The process defines treatment parameters aimed at producing a change in reflectance at a specific wavelength of EUV radiation within the reflective multilayer of the photomask. By calculating the necessary changes in reflectance to rectify the mapped CD variation, Kruglyakov's method directs a treatment beam to the specified region, effectively enhancing the accuracy of the photolithography process.
Career Highlights
Vladimir Kruglyakov's career includes valuable experience with highly regarded companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMS Ltd. His work in these organizations has been pivotal in developing cutting-edge technologies that drive the evolution of lithographic processes in semiconductor production.
Collaborations
Throughout his career, Kruglyakov has collaborated with talented professionals, including Sergey Oshemkov and Frederik Blumrich. These partnerships have enhanced his research and innovation efforts, contributing to notable advancements in the field.
Conclusion
Vladimir Kruglyakov stands out as a key figure in the realm of extreme ultraviolet lithography. Through his inventive work and partnerships with leading companies and professionals, he continues to influence the technology that shapes the future of semiconductor manufacturing. His commitment to innovation and excellence remains evident through his ongoing contributions to the field.
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