Carl Zeiss Smt Gmbh

Carl Zeiss Sms Ltd.

Vladimir Kruglyakov

Sergey Oshemkov

Yuval Perets

Frederik Blumrich

Vladimir Dmitriev

Markus Mengel

Guy Ben-Zvi

Eitan Zait

Steven Labovitz

Ralph Klaesges

A method of correcting a critical dimension (CD) variation in extreme ultraviolet (EUV) photolithography includes mapping the CD variation of a wafer exposure field formed by a photolithography system that includes an EUV photolithography photomask. Parameters of a treatment to produce a change in reflectance at a working wavelength of EUV radiation in a region of a reflective multilayer of the photomask are determined, the change in reflectance being calculated to correct the mapped CD variation. A treatment beam is directed to the region. The region is treated with the beam in accordance with the determined parameters.

Critical dimension variation correction in extreme ultraviolet lithography

A method for repairing a defect on a substrate surface includes placing on the defect a nanoparticle that includes a conductive material. A region of the substrate surface in which the nanoparticle is placed is irradiated, the region being larger than the nanoparticle. An energy density of the irradiation is below a modification threshold for the substrate surface.

Surface defect repair by irradiation

A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.

Controllable transmission and phase compensation of transparent material

Growing community of inventors

Migdal Haemek, Israel

Vladimir Kruglyakov