Company Filing History:
Years Active: 2007-2008
Title: Veer Dhandapani: Innovator in Semiconductor Technology
Introduction
Veer Dhandapani is a notable inventor based in Round Rock, TX (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing semiconductor processes and devices, showcasing his expertise and innovative spirit.
Latest Patents
Dhandapani's latest patents include "Selective silicon deposition for planarized dual surface orientation integration" and "Method for making a semiconductor device with strain enhancement." The first patent describes a semiconductor process and apparatus that provide a planarized hybrid substrate with a more uniform polish surface. This is achieved by thickening an SOI semiconductor layer in relation to a previously or subsequently formed epitaxial silicon layer through a selective silicon deposition process. The result is a high-performance CMOS device that includes high-k metal PMOS gate electrodes with improved hole mobility. The second patent outlines a method for forming a semiconductor device with strain enhancement, detailing the process of implanting a semiconductor substrate and control electrode to create doped current electrode regions.
Career Highlights
Veer Dhandapani is currently employed at Freescale Semiconductor, Inc., where he continues to innovate in the semiconductor industry. His work has contributed to advancements in semiconductor device performance and manufacturing processes.
Collaborations
Dhandapani has collaborated with notable coworkers such as Da Zhang and Bich-Yen Nguyen, further enhancing the innovative environment at Freescale Semiconductor.
Conclusion
Veer Dhandapani's contributions to semiconductor technology through his patents and work at Freescale Semiconductor, Inc. highlight his role as a key innovator in the field. His advancements continue to influence the development of high-performance semiconductor devices.