Kirkland, WA, United States of America

Vahan Senekerimyan

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Mitutoyo Corporation. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vahan Senekerimyan. Retrieved from https://idiyas.com/inventor/vahan-senekerimyan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Vahan Senekerimyan: Innovator in Metrology Systems

Introduction

Vahan Senekerimyan is a notable inventor based in Kirkland, WA (US). He has made significant contributions to the field of metrology, particularly with his innovative patent that enhances the measurement of circular workpieces. His work is instrumental in improving precision in various manufacturing processes.

Latest Patents

Vahan holds a patent for a "Metrology system for measuring edge of circular workpiece." This metrology system features an illumination configuration that includes an illumination source, an objective lens configuration, and an image sensor configuration. The system is designed to provide accurate measurements by directing illumination toward the edge of a circular workpiece, allowing for precise imaging and analysis.

Career Highlights

Vahan is currently employed at Mitutoyo Corporation, a leading company in precision measurement technology. His role involves developing advanced metrology solutions that cater to the needs of various industries. With his expertise, he has contributed to enhancing the capabilities of measurement systems.

Collaborations

Vahan collaborates with Christopher Richard Hamner, working together to push the boundaries of metrology technology. Their combined efforts aim to innovate and improve measurement techniques in the industry.

Conclusion

Vahan Senekerimyan's contributions to metrology through his innovative patent and work at Mitutoyo Corporation highlight his importance in the field. His dedication to precision measurement continues to influence advancements in manufacturing and engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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