The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Sep. 16, 2024
Mitutoyo Corporation, Kanagawa-ken, JP;
Christopher Richard Hamner, Kirkland, WA (US);
Vahan Senekerimyan, Kirkland, WA (US);
Mitutoyo Corporation, Kanagawa-Ken, JP;
Abstract
A metrology system is provided including a lighting configuration, a camera, a scan lens, a mirror configuration and a variable focal length (VFL) lens. The mirror configuration is utilized to adjust to different imaged fields of view as corresponding to different view positions through the scan lens. For each imaged field of view, the camera is utilized to acquire a corresponding image set including images of the workpiece, wherein the VFL lens is controlled to rapidly vary the focus position of the metrology system for acquiring the images (e.g., wherein each image corresponds to different focus position data). For each corresponding image set, focus position data is determined that indicates three dimensional positions of a plurality of surface points on the workpiece that are within the corresponding field of view (e.g., enabling determinations of measurements of workpiece features that are within the corresponding field of view).