Mitutoyo Corporation

Asml Netherlands B.v.

Vahan Senekerimyan

William N Partlo

Igor Vladimirovich Fomenkov

Christopher Richard Hamner

Nam-Hyong Kim

Robert N Bergstedt

A metrology system includes an illumination configuration having an illumination source, an objective lens configuration, and an image sensor configuration including an image sensor. The objective lens configuration includes an objective lens and has a lens optical axis. The illumination configuration, the objective lens configuration and the image sensor configuration form an optical path along which illumination from the illumination configuration travels. The illumination configuration provides illumination in an illumination direction toward at least a portion of an edge of a circular workpiece that is along the optical path. At least part of the illumination configuration is tilted relative to the objective lens configuration such that the illumination direction is at a first tilt angle in relation to the lens optical axis. The objective lens configuration directs illumination toward the image sensor configuration which is configured to provide an image corresponding to the edge of the circular workpiece.

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Kirkland, WA, United States of America

Vahan Senekerimyan