Company Filing History:

12 out of 12,890

Advanced Micro Devices Corporation

Years Active: 2005-2014

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8888947 - Method and system for advanced process control in an etch system by gas flow control on the basis of CD measurements (2014-11-18),

2. 8155770 - Method and apparatus for dispatching workpieces to tools based on processing and performance history (2012-04-10),

3. 8039181 - Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario (2011-10-18),

4. 7842442 - Method and system for reducing overlay errors within exposure fields by APC control strategies (2010-11-30),

5. 7704889 - Method and system for advanced process control in an etch system by gas flow control on the basis of CD measurements (2010-04-27),

6. 7618755 - Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields (2009-11-17),

7. 7547561 - Advanced process control model incorporating a target offset term (2009-06-16),

8. 7542880 - Time weighted moving average filter (2009-06-02),

9. 7403832 - Method and system for advanced process control including tool dependent machine constants (2008-07-22),

10. 7233835 - Method and system for estimating a state of an uninitialized advanced process controller by using segregated controller data (2007-06-19),

11. 7200455 - Method of process control (2007-04-03),

12. 7006195 - Method and system for improving exposure uniformity in a step and repeat process (2006-02-28),

13. 6946411 - Method and system for improving the efficiency of a mechanical alignment tool (2005-09-20),

Title: Uwe Schulze: Innovator in Advanced Process Control

Introduction

Uwe Schulze is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of advanced process control, particularly in the semiconductor industry. With a total of 13 patents to his name, Schulze's work has enhanced the performance and reliability of metallization structures.

Latest Patents

One of his latest patents is a method and system for advanced process control in an etch system by gas flow control based on critical dimension (CD) measurements. This innovation allows for the control of the flow rate of gaseous components during the formation of metal lines and vias. By utilizing feedback measurement data, process variations can be minimized, leading to improved performance and reliability.

Another notable patent is the method and apparatus for dispatching workpieces to tools based on processing and performance history. This invention involves retrieving metrology data associated with multiple workpieces processed at various operations. It determines a processing context for each workpiece and identifies performance metrics for tools capable of performing the selected operation. This ensures that workpieces are dispatched to the most suitable tools based on their processing context and performance metrics.

Career Highlights

Throughout his career, Uwe Schulze has worked with leading companies in the semiconductor industry, including Advanced Micro Devices Corporation and GlobalFoundries Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Schulze has collaborated with notable colleagues such as Rolf Seltmann and Jan Raebiger. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.

Conclusion

Uwe Schulze's contributions to advanced process control have made a significant impact on the semiconductor industry. His innovative patents and collaborations highlight his dedication to enhancing technology and improving manufacturing processes.

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