The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2006
Filed:
Jul. 23, 2003
Jan Raebiger, Dresden, DE;
Heiko Wagner, Dresden, DE;
Uwe Schulze, Dresden, DE;
Rolf Seltmann, Dresden, DE;
Jan Raebiger, Dresden, DE;
Heiko Wagner, Dresden, DE;
Uwe Schulze, Dresden, DE;
Rolf Seltmann, Dresden, DE;
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
An advanced control system for a photolithography tool that receives measurement data relating to inline parameters varying with position on a substrate surface. The position sensitive measurement data is used to establish a position dependent target offset for an exposure map, thereby effectively compensating for substrate non-uniformities. Since the inline measurement data is available significantly earlier in comparison to electrical measurement data of a completed circuit element, a more accurate exposure map may be obtained taking into account the process history of the substrates.