Ute Buttgereit

Title: Ute Buttgereit: Innovator in Photolithography

Introduction

Ute Buttgereit, an accomplished inventor based in Jena, Germany, has made significant contributions to the field of semiconductor lithography. With a total of six patents to her name, Buttgereit's innovations have advanced the way photomasks are measured and analyzed in various photolithographic processes.

Latest Patents

One of her latest patents is focused on a method for measuring photomasks used in semiconductor lithography. This innovative method involves several crucial steps that enhance the accuracy of photomask measurements, laying the groundwork for more precise imaging in semiconductor fabrication. Another notable patent introduced by Buttgereit pertains to a method and appliance designed for predicting the imaging result obtained with a mask during lithography processes. This invention aims to optimize the exposure of wafers coated with photoresist by carefully analyzing the interaction of illumination light with mask structures. The method employs a mathematical simulation that considers the amplitude and phase of the electric field created when light interacts with the mask, ultimately improving the efficiency of lithography operations.

Career Highlights

Throughout her career, Ute Buttgereit has worked with leading companies in the optics and semiconductor industries, including Carl Zeiss SMT GmbH and Carl Zeiss SMS Ltd. Her expertise in the field has allowed her to remain at the forefront of technological advancements, contributing to significant projects and innovations.

Collaborations

Buttgereit's innovative spirit is further exemplified by her collaborations with notable individuals in the field, such as Thomas Thaler and Holger Seitz. These partnerships have fostered a collaborative environment that promotes knowledge sharing and drives invention in state-of-the-art photolithography techniques.

Conclusion

Ute Buttgereit’s impressive portfolio of patents and her active role in the semiconductor lithography field exemplify her impact as an inventor. Her work not only enhances understanding and measurement of photomasks but also pushes the boundaries of what's possible in semiconductor manufacturing. As technology continues to evolve, inventors like Ute Buttgereit will remain at the helm of innovation, propelling advancements in this critical industry.