Location History:
- Gottingen, DE (1992 - 2002)
- Göttingen, DE (2002 - 2004)
- Goettingen, DE (2003 - 2004)
Company Filing History:
12 out of 150 
2 out of 15 
1 out of 3 Years Active: 1992-2004
Title: Ulrich Rebhan: Innovator in Extreme Ultraviolet Radiation Technology
Introduction
Ulrich Rebhan is a prominent inventor based in Göttingen, Germany. He has made significant contributions to the field of extreme ultraviolet (EUV) radiation technology, holding a total of 12 patents. His work focuses on developing methods and systems that enhance the generation of high output power gas discharge sources.
Latest Patents
Among his latest patents is a groundbreaking method and apparatus for generating high output power gas discharge based sources of extreme ultraviolet radiation and/or soft x-rays. This innovative system includes a plasma chamber filled with a gas mixture, multiple electrodes defining a plasma region, and a power supply circuit that energizes the plasma to produce an EUV beam. Additionally, the system features a preionizer for ionizing the gas mixture, preparing it to form a dense plasma upon application of the main pulse. Another notable patent involves a gas discharge laser equipped with a heating element that removes gas impurities, ensuring optimal performance in excimer and molecular fluorine lasers.
Career Highlights
Ulrich Rebhan has dedicated his career to advancing technologies that utilize extreme ultraviolet radiation. His work at Lambda Physik AG has positioned him as a key figure in the development of innovative laser systems. His patents reflect a commitment to improving the efficiency and effectiveness of gas discharge sources.
Collaborations
Throughout his career, Ulrich has collaborated with notable colleagues, including Igor Bragin and Uwe Stamm. These partnerships have contributed to the successful development of his patented technologies.
Conclusion
Ulrich Rebhan's contributions to the field of extreme ultraviolet radiation technology are significant and impactful. His innovative patents and collaborative efforts continue to shape advancements in laser technology.