The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Dec. 30, 1999
Lambda Physik AG, Goettingen, DE;
Abstract
A beam shutter apparatus designed to handle high powered UV radiation is disclosed. The shutter includes a high reflectivity mirror mounted on a plate which can be rotated between a first position where the beam is reflected and redirected to a tool such as a beam dump and a second position where the beam is free to pass out of the laser, where the beam is free to pass out of the laser The shutter includes a support base with an angled upper surface upon which the mirror plate rests when in the second position. The support base has a beam path channel designed so that a beam can pass through the support base and out of the shutter when the mirrored plate is in the first position. The mirrored plate is rotated by a linkage, which is driven by an electrically powered actuator on a rotational magnet. The support base is machined out of a monolithic piece of metal allowing very high precision without the need for cumbersome alignment procedures.