The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2003
Filed:
Nov. 30, 2000
Ulrich Rebhan, Goettingen, DE;
Lambda Physik AG, Goettingen, DE;
Abstract
A method for testing a material block prior to forming the material block into one or more optical components for use with a sub-micron lithographic, high power, narrow bandwidth laser system having high wavelength stability includes the step of selecting a block of material having appropriate characteristic optical properties for the source laser system being used. The next step is to test the material block for absorption performance. Then, if the block exhibits a sufficient absorption performance, then one of more optical components such as one or more prisms, etalons, and/or windows, etc. are formed from the material block. Finally, the optical components formed from the block are inserted into a wavelength selection module of the resonator of the laser to participate in producing a high power, narrow bandwidth laser beam which may be used in sub-micron photolithographic applications.