This inventor holds 2 USPTO granted patents. Top assignee: Cymer, Inc.. Active years: 2023-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023-2026
Title: Ulrich Niemann: Innovator in Laser Technology
Introduction
Ulrich Niemann is a notable inventor based in San Diego, CA. He has made significant contributions to the field of laser technology, particularly in the area of dust trapping systems for gas discharge lasers. His innovative approach has led to advancements that enhance the efficiency and effectiveness of laser operations.
Latest Patents
Niemann holds a patent for "Nonwoven screens for dust trapping in laser discharge chambers." This system is designed to remove particulate matter from the gas in a gas discharge laser. The nonwoven screens are optimized for manufacturability and feature integration. They are configured to precisely direct the flow, optimizing the separation of particles from the gas flow while providing sufficient surface area for improved dust adherence. This patent showcases his commitment to enhancing laser technology.
Career Highlights
Ulrich Niemann is currently employed at Cymer, Inc., a company known for its cutting-edge technology in the semiconductor industry. His work at Cymer has allowed him to apply his innovative ideas in practical applications, contributing to the advancement of laser systems used in various technologies.
Collaborations
Niemann has collaborated with various professionals in his field, including his coworker Walter Dale Gillespie. These collaborations have fostered an environment of innovation and have led to the development of new technologies that benefit the industry.
Conclusion
Ulrich Niemann's contributions to laser technology through his patent and work at Cymer, Inc. highlight his role as an influential inventor. His innovative solutions continue to impact the field positively, showcasing the importance of creativity and collaboration in technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
