The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2023
Filed:
Nov. 21, 2018
Applicant:
Cymer, Llc, San Diego, CA (US);
Inventors:
Ulrich Niemann, San Diego, CA (US);
Walter Dale Gillespie, Poway, CA (US);
Assignee:
Cymer, LLC, San Diego, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 46/10 (2006.01); B01D 39/10 (2006.01); B01D 50/20 (2022.01); B32B 7/03 (2019.01); F01N 3/023 (2006.01); B01D 45/08 (2006.01);
U.S. Cl.
CPC ...
F01N 3/023 (2013.01); B01D 39/10 (2013.01); B01D 45/08 (2013.01); B01D 46/10 (2013.01); B01D 50/20 (2022.01); B01D 2279/45 (2013.01);
Abstract
A system for removing particulate matter from the gas in a gas discharge laser includes one or more nonwoven screens which are optimized for, among others, manufacturability and feature integration. The nonwoven screens are configured for precisely directing the flow to optimize the separation of particles from the gas flow and provide sufficient surface area for improved dust adherence.