Tainan, Taiwan

Tzung-Shiun Liu


Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017-2022

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5 patents (USPTO):Explore Patents

Title: Tzung-Shiun Liu: Innovator in Photolithography Technology

Introduction

Tzung-Shiun Liu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of photolithography, with a focus on developing advanced technologies that enhance the manufacturing process in semiconductor production. Liu holds a total of 5 patents, showcasing his innovative spirit and technical expertise.

Latest Patents

One of Liu's latest patents is titled "Lithographic mask, a pellicle therein and method of forming the same." This invention provides a mask for photolithography patterning, which includes a substrate and a pattern layer on its surface. The mask is designed with a pellicle that isolates the pattern layer from the ambient environment. The pellicle features a membrane, a frame for securing the membrane, and an optical member within the membrane. This invention aims to improve the accuracy and reliability of photolithography processes.

Another notable patent is the "Apparatus and method for developing a photoresist coated substrate." This apparatus includes a developing tank with a fluid manifold that has multiple holes and valves. The design allows for controlled flow of developer and rinsing fluids, enhancing the efficiency of the development process. A controller is integrated to manage the opening and closing of each valve, ensuring precise operation.

Career Highlights

Tzung-Shiun Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him at the forefront of technological advancements in semiconductor manufacturing. Liu's innovative contributions have played a crucial role in enhancing the efficiency and effectiveness of photolithography techniques.

Collaborations

Liu has collaborated with several talented individuals in his field, including Ching-Yueh Chen and Chun-Lang Chen. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Tzung-Shiun Liu is a distinguished inventor whose work in photolithography has significantly impacted the semiconductor industry. His innovative patents and contributions to Taiwan Semiconductor Manufacturing Company Limited highlight his dedication to advancing technology. Liu's achievements serve as an inspiration for future inventors in the field.

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