The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 30, 2020

Filed:

Nov. 02, 2018
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Tzung-Shiun Liu, Tainan, TW;

Chun-Lang Chen, Tainan County, TW;

Ching-Yueh Chen, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 (2006.01); G03F 7/00 (2006.01); G03F 7/09 (2006.01); G03F 7/32 (2006.01); G03F 1/50 (2012.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0025 (2013.01); G03F 1/50 (2013.01); G03F 7/003 (2013.01); G03F 7/094 (2013.01); G03F 7/30 (2013.01); G03F 7/32 (2013.01);
Abstract

An apparatus includes a developing tank and a fluid manifold in the bottom of the developing tank. The fluid manifold includes a plurality of holes through which developer flows and a plurality of valves corresponding to the plurality of holes. The valves allow developer to flow through the holes when open and prevent developer from flowing through the holes when closed. A trench surrounds the fluid manifold through which developer is drained from the developing tank. A controller is configured to control opening and closing of the valves. In an embodiment, the apparatus includes a clamping mechanism configured to insert the substrate into and remove the substrate from the developing tank.


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