Tainan, Taiwan

Tzu Han Liu

USPTO Granted Patents = 9 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2020-2025

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9 patents (USPTO):Explore Patents

Title: Tzu Han Liu: Innovator in Photolithography Solutions

Introduction

Tzu Han Liu is a prominent inventor based in Tainan, Taiwan, with a commendable portfolio of 8 patents. His innovative contributions primarily focus on methods and processes used in the semiconductor manufacturing industry, particularly in photolithography, which is essential for producing integrated circuits.

Latest Patents

Among his latest patents, Tzu Han Liu has developed a "Method for Removing Particles from Pellicle and Photomask." This method outlines a procedure for eliminating particles that may impair the functionality of photomasks. It involves focusing a light beam on a particle situated on a pellicle membrane, effectively attracting and trapping it at a specific focal region before removal.

Another significant patent is the "Particle Prevention Method in Reticle Pod." This innovative approach addresses the issue of gas entering the reticle pod during the removal of reticles. By utilizing a fluid regulating module sealed with a film, the method ensures that the pod remains uncontaminated while transferring the reticle to a process tool for lithography operations.

Career Highlights

Tzu Han Liu's work primarily takes place at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a global leader in semiconductor manufacturing. His contributions to the field have enhanced production efficiency and product quality, cementing his reputation as a key figure in the industry.

Collaborations

Throughout his career, Tzu Han Liu has collaborated with talented professionals, including Chih-Wei Wen and Chung-Hung Lin. Together, they have contributed to groundbreaking innovations that drive the advancement of photolithography technology within the semiconductor sector.

Conclusion

Tzu Han Liu's contributions to the field of semiconductor manufacturing through his patents demonstrate a profound understanding of the challenges faced in photolithography. His innovative solutions are poised to play a critical role in advancing technology and maintaining the quality of semiconductor products in the ever-evolving tech landscape.

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