The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Aug. 09, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Tzu Han Liu, Tainan, TW;

Chih-Wei Wen, Tainan, TW;

Chung-Hung Lin, Tainan, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/66 (2012.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
G03F 1/66 (2013.01); H01L 21/67359 (2013.01); H01L 21/67376 (2013.01); H01L 21/67386 (2013.01);
Abstract

A method is provided. The method includes detaching an upper shell of a reticle pod from a base. The method further includes while the upper shell is detached from the base, blocking an inlet flow of gas from entering an interior of the reticle pod between the upper shell and the base with a use of a fluid regulating module which is in a sealed state. In the sealed state of the fluid regulating module, an opening of the fluid regulating module is covered with a sealing film. The method also includes removing a reticle positioned on the base to a process tool. In addition, the method includes performing a lithography operation in the process tool with the use of the reticle.


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