The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2025
Filed:
May. 20, 2022
Applicant:
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
Inventors:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09J 201/08 (2006.01); B32B 27/30 (2006.01); B32B 27/40 (2006.01); C09J 7/30 (2018.01); G03F 1/24 (2012.01); G03F 1/48 (2012.01); G03F 1/60 (2012.01);
U.S. Cl.
CPC ...
G03F 1/48 (2013.01); B32B 27/304 (2013.01); B32B 27/40 (2013.01); C09J 7/30 (2018.01); C09J 201/08 (2013.01); G03F 1/24 (2013.01); G03F 1/60 (2013.01);
Abstract
The present disclosure provides a photomask and a method for fabricating a semiconductor structure with a photomask. The photomask includes a substrate, and a polymer layer over a surface of the substrate, wherein the polymer layer includes a thermoplastic polymer and a hydrophobic layer, wherein the thermoplastic polymer is between the hydrophobic layer and the surface of the photomask.