This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2017-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017-2026
Title: Tzu-Chun Lin: Innovator in Plasma Reactor Technology
Introduction
Tzu-Chun Lin is a notable inventor based in Zhudong, Taiwan. He has made significant contributions to the field of plasma reactor technology. His innovative work has led to the development of a unique high-density plasma reactor.
Latest Patents
Tzu-Chun Lin holds a patent for a "High density plasma reactor with multiple top coils." This plasma reactor features an enclosure that defines a processing chamber, with inlets for injecting process gas and an outlet for withdrawing gas. A platform supports a wafer above the bottom of the chamber, while multiple coils positioned above the chamber are coupled to a radio frequency generator. This invention enhances the efficiency and effectiveness of plasma processing.
Career Highlights
Tzu-Chun Lin is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to advancements in semiconductor manufacturing technologies.
Collaborations
Some of Tzu-Chun Lin's coworkers include Chi-Ching Lo and Po-Hsiung Leu. Their collaboration in the field of semiconductor technology has fostered innovation and development.
Conclusion
Tzu-Chun Lin's contributions to plasma reactor technology exemplify the spirit of innovation in the semiconductor industry. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key inventor in this field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile