Hsinchu, Taiwan

Tun-Fu Hung

This inventor holds 3 USPTO granted patents. Top assignee: Mosel Vitelic Corporation. Active years: 2000-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tun-Fu Hung. Retrieved from https://idiyas.com/inventor/tun-fu-hung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 13(Granted Patents)


Location History:

  • Kaohsiung Hsien, TW (2000)
  • Hsinchu, TW (2006 - 2009)

Company Filing History:


Years Active: 2000-2009

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3 patents (USPTO):Explore Patents

Title: Innovations of Tun-Fu Hung

Introduction

Tun-Fu Hung is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of electronic device fabrication, holding a total of 3 patents. His work focuses on innovative methods that enhance the performance and efficiency of electronic components.

Latest Patents

One of his latest patents is titled "Method for forming a gate structure through an amorphous silicon layer and applications thereof." This patent describes a fabrication method that involves providing a substrate layer and forming an amorphous silicon layer at a specific reaction temperature. Another significant patent is "Method for fabricating trench power device," which outlines a fabrication method aimed at reducing Miller capacitance and RC delay in power devices.

Career Highlights

Tun-Fu Hung is currently employed at Mosel Vitelic Corporation, where he continues to innovate in the field of electronic devices. His expertise in fabrication methods has positioned him as a valuable asset to his company and the industry at large.

Collaborations

He has collaborated with notable coworkers such as Jen Chieh Chang and Ming-Ren Chi, contributing to various projects that advance technology in their field.

Conclusion

Tun-Fu Hung's contributions to electronic device fabrication through his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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