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Tsuyoshi Furukawa

USPTO Granted Patents = 13 (Patent Applications = 8)

Average Co-Inventor Count = 3.5

ph-index = 6

Forward Citations = 92(Granted Patents)

Location History:

Kawasaki, JP (1995 - 1999)
Nagano, JP (2001)
Tsukubashi, JP (2011)
Tokyo, JP (1997 - 2022)

Company Filing History:

Takachiho Koheki Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 1995-2022

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11429024 - Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion (2022-08-30),

2. 9354523 - Composition for resist pattern-refinement, and fine pattern-forming method (2016-05-31),

3. 9150962 - Method for producing substrate with metal body (2015-10-06),

4. 8318582 - Method of forming a trench isolation (2012-11-27),

5. 8017700 - Polycarbosilane, method for producing same, silica composition for coating application, and silica film (2011-09-13),

6. 6195236 - Magnetic head assembly, having a spring arm configured for removable attachment to a carriage arm (2001-02-27),

7. 5859746 - Magnetic disk drive and flexible printed board used in such drive (1999-01-12),

8. 5754354 - Magnetic disk drive unit with complex magnetic head of variable reading (1998-05-19),

9. 5673159 - Magnetic disk apparatus (1997-09-30),

10. 5638672 - Chain cable retainer (1997-06-17),

11. 5590001 - Breather filter unit for magnetic disk drive (1996-12-31),

12. 5583720 - Magnetic disk drive and flexible printed board used in such drive (1996-12-10),

13. 5400195 - Magnetic disk apparatus with flexible printed circuit attached to head (1995-03-21),

Title: Tsuyoshi Furukawa: Innovator in Radiation-Sensitive Resin Technology

Introduction

Tsuyoshi Furukawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, with a total of 13 patents to his name. His work has been instrumental in advancing technologies related to resist pattern formation and fine patterning methods.

Latest Patents

Furukawa's latest patents include a radiation-sensitive resin composition and a resist pattern-forming method. The radiation-sensitive resin composition features a polymer with an acid-labile group and a compound represented by a specific formula. This composition is designed to enhance the performance of resist materials used in various applications. Additionally, his work on a composition for resist pattern-refinement includes various ions and solvents, ensuring a high percentage of blended ions for effective pattern formation.

Career Highlights

Throughout his career, Tsuyoshi Furukawa has worked with notable companies such as Fujitsu Corporation and JSR Corporation. His experience in these organizations has allowed him to develop innovative solutions in the field of materials science and engineering.

Collaborations

Furukawa has collaborated with esteemed colleagues, including Tsuneyori Ino and Masaki Jinbo. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Tsuyoshi Furukawa's contributions to radiation-sensitive resin technology and his extensive patent portfolio highlight his role as a leading innovator in the field. His work continues to influence advancements in resist materials and patterning methods, showcasing the importance of innovation in technology.

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