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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11429024 B1

PDFFull Text
Date of Patent:
Aug. 30, 2022

Filed:

Jun. 05, 2020

Radiation-sensitive resin composition, resist pattern-forming method, compound, and method of controlling acid diffusion

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Ryuichi Nemoto, Tokyo, JP;

Tsuyoshi Furukawa, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Anca Eoff

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 69/712 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); C08F 220/28 (2006.01); C08F 220/38 (2006.01); C08F 220/18 (2006.01); C07D 327/04 (2006.01); C07D 309/12 (2006.01); C07D 319/20 (2006.01); C07C 65/21 (2006.01); C07C 323/12 (2006.01); C07C 25/02 (2006.01); C07C 381/12 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 25/02 (2013.01); C07C 65/21 (2013.01); C07C 69/712 (2013.01); C07C 323/12 (2013.01); C07C 381/12 (2013.01); C07D 309/12 (2013.01); C07D 319/20 (2013.01); C07D 327/04 (2013.01); C08F 220/1805 (2020.02); C08F 220/283 (2020.02); C08F 220/382 (2020.02); C08F 220/387 (2020.02); G03F 7/038 (2013.01); G03F 7/039 (2013.01); C07C 2601/08 (2017.05); C07C 2601/14 (2017.05); C07C 2603/74 (2017.05); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01);
Abstract

The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Arrepresents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar; and Rrepresents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.

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