Tokyo, Japan

Tsutomu Shoki

USPTO Granted Patents = 76 

 

Average Co-Inventor Count = 2.1

ph-index = 7

Forward Citations = 154(Granted Patents)

Forward Citations (Not Self Cited) = 130(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Tama, JP (2002 - 2005)
  • Hachioji, JP (1998 - 2007)
  • Shinjuku-ku, JP (2013 - 2018)
  • Tokyo, JP (1999 - 2024)

Company Filing History:


Years Active: 1998-2025

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Areas of Expertise:
Reflective Mask
Semiconductor Device
Reflective Mask Blank
Multilayer Reflective Film
Manufacturing Method
Transmissive Mask
Conductive Film
Mask Blank Substrate
Fabrication Method
Substrate Manufacturing
Electrically Conductive Film
Reflective Structure
76 patents (USPTO):Explore Patents

Title: The Innovative Journey of Tsutomu Shoki

Introduction

Tsutomu Shoki, based in Tokyo, Japan, is a notable inventor with a remarkable portfolio of 75 patents. His work primarily focuses on the field of semiconductor technology, particularly in the development of reflective mask blanks and methods for enhancing their performance. His contributions are significant in advancing the capabilities of photolithography used in semiconductor manufacturing.

Latest Patents

Among his latest patents is the innovative "Reflective Mask Blank and Reflective Mask." This invention features a phase shift film that minimizes the dependency of phase difference and reflectance on the film's thickness. It also includes advancements in reducing the shadowing effect of reflective masks, allowing for the formation of fine and highly accurate phase-shift patterns. Additionally, he developed methods related to a reflective mask blank that features a multilayer reflective film and a phase-shift film, characterized by the presence of a thin film containing various metal elements including ruthenium (Ru) and several other critical materials.

Career Highlights

Throughout his career, Tsutomu Shoki has made significant strides in the technology sector. He has held positions at reputable organizations such as Hoya Corporation and Osaka University. His work has contributed to the evolving landscape of semiconductor manufacturing and has earned him recognition as a leader in his field.

Collaborations

Tsutomu Shoki has collaborated with esteemed colleagues, including Kazuhiro Hamamoto and Yohei Ikebe. These partnerships have allowed for the exchange of ideas and has bolstered innovation in their respective projects, pushing the boundaries of current technologies.

Conclusion

In conclusion, Tsutomu Shoki's extensive body of work and innovative patents have cemented his status as a key player in semiconductor technology. His dedication to advancing reflective mask technology has not only opened new avenues for research but has also enhanced the efficiency and precision of semiconductor devices. As he continues to innovate, the impact of his contributions will be felt for years to come.

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