Hsinchu, Taiwan

Tsung-Han Chuang

USPTO Granted Patents = 6 

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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6 patents (USPTO):Explore Patents

Title: **Innovations of Tsung-Han Chuang: A Semiconductor Pioneer from Hsinchu**

Introduction

Tsung-Han Chuang is an accomplished inventor based in Hsinchu, Taiwan. With a significant contribution to the field of semiconductor technology, he holds two patents that showcase his innovative approach to device design. His work has propelled advancements in semiconductor devices, emphasizing the importance of refined channel structures and efficient material usage.

Latest Patents

Tsung-Han Chuang's latest patents reflect cutting-edge technology in semiconductor devices. The first patent, titled "Semiconductor device with wrap around silicide and hybrid fin," describes a device that comprises a substrate, wherein a first channel region of a first transistor overlays the substrate, and a source/drain region is in contact with said channel. This groundbreaking design introduces a silicide layer strategically placed on various surfaces to enhance performance.

The second patent, "Field effect transistor with inner spacer liner layer and method," explains an innovative structure that employs a first nanostructure channel positioned above the substrate, with a second nanostructure channel interposed between them. An inner spacer between the channels improves the efficiency of the field effect transistor. These patents reflect Chuang's commitment to pushing the boundaries of semiconductor technology.

Career Highlights

Chuang's professional journey has been closely associated with Taiwan Semiconductor Manufacturing Company Ltd. (TSMC), a global leader in semiconductor manufacturing. His tenure at TSMC has provided him with the platform to explore and invent essential technologies that are foundational to modern electronics.

Collaborations

Throughout his career, Tsung-Han Chuang has collaborated with various research institutions and industry professionals to drive innovations in semiconductor engineering. His collaborative efforts have not only strengthened his inventions but also contributed to the broader field of semiconductor technology, making strides toward more efficient and powerful devices.

Conclusion

In conclusion, Tsung-Han Chuang stands out as a notable inventor from Hsinchu, Taiwan. His contributions to the semiconductor industry, showcased through his two patents, underline his innovative spirit and commitment to advancing technology. With his ongoing work, Chuang continues to inspire future developments in the realm of electronics and semiconductor devices.

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