Taipei, Taiwan

Tsung-Chuan Lee


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2017-2024

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7 patents (USPTO):

Title: The Innovative Contributions of Tsung-Chuan Lee

Introduction

Tsung-Chuan Lee, a prominent inventor based in Taipei, Taiwan, has made significant strides in the field of semiconductor technology. With a total of seven patents to his name, Lee's work focuses primarily on extreme ultraviolet lithography methods that push the boundaries of modern manufacturing techniques.

Latest Patents

Among his latest innovations are two standout patents. The first is an "Extreme Ultraviolet Lithography Method," which outlines a detailed process for forming a multilayer Mo/Si stack on a mask substrate. This innovative method includes the deposition of a ruthenium capping layer, followed by a complex doping process, leading to the creation of an effective absorber layer that ultimately facilitates precise patterning.

The second patent, titled "Operating Method for Preventing Photomask Particulate Contamination," presents a sophisticated approach to safeguard photomasks from contamination. This method employs a series of voltages to attract and repulse particles, ensuring the cleanliness necessary for high-quality lithography.

Career Highlights

Tsung-Chuan Lee's career is marked by his association with Taiwan Semiconductor Manufacturing Company Ltd., a leading player in the semiconductor industry. His contributions have greatly advanced the capabilities of photolithography, which is crucial for the fabrication of integrated circuits.

Collaborations

Throughout his career, Lee has collaborated with esteemed colleagues, including Chih-Tsung Shih and Yu-Hsun Wu. Their combined expertise has culminated in innovative solutions that address critical challenges in semiconductor manufacturing.

Conclusion

In summary, Tsung-Chuan Lee's inventive spirit and dedication to his field have resulted in significant advancements in extreme ultraviolet lithography and contamination prevention. As he continues to explore new frontiers in semiconductor technology, his work remains instrumental in shaping the future of the industry.

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