Ebina, Japan

Tsuneo Mano


Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 157(Granted Patents)


Location History:

  • Isehara, JP (1987 - 1988)
  • Ebina, JP (1995 - 2001)

Company Filing History:


Years Active: 1987-2001

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4 patents (USPTO):Explore Patents

Title: Tsuneo Mano: Innovator in Semiconductor Technology

Introduction

Tsuneo Mano is a prominent inventor based in Ebina, Japan, known for his contributions to semiconductor technology. With a total of 4 patents to his name, he has made significant advancements in the field, particularly in the design and functionality of semiconductor devices.

Latest Patents

One of his latest inventions is a semiconductor device that includes a silicon layer and an insulating layer formed on it. This device features a first semiconductor component that converts light into an electric signal and a second semiconductor component shielded from light by a silicon region. A unique through hole is also incorporated to allow light input to the first semiconductor device. Another notable patent is for a semiconductor memory that includes a matrix of memory cells, bit lines, and word lines for data access. This memory features a test circuit that allows for simultaneous writing and comparison of test data with expected values, enhancing the efficiency of memory testing.

Career Highlights

Throughout his career, Tsuneo Mano has worked with notable companies such as Nippon Telegraph and Telephone Corporation and NTT Electronics Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Tsuneo Mano has collaborated with several professionals in the field, including Junzo Yamada and Tsuneo Matsumura. These collaborations have likely fostered a rich exchange of ideas and advancements in semiconductor technology.

Conclusion

Tsuneo Mano's contributions to semiconductor technology through his patents and career achievements highlight his role as an influential inventor in the industry. His work continues to impact the field and inspire future innovations.

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