Company Filing History:

23 out of 40,635

Taiwan Semiconductor Manufacturing Comp. Ltd.

Epitech Technology Corporation

patents

Years Active: 1998-2012

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26 patents (USPTO):Sort by Forward CitationsExplore Patents

1. RE43426 - Fabrication method of transparent electrode on visible light-emitting diode (2012-05-28),

2. 7541205 - Fabrication method of transparent electrode on visible light-emitting diode (2009-06-02),

3. 7192794 - Fabrication method of transparent electrode on visible light-emitting diode (2007-03-20),

4. 6436762 - Method for improving bit line to capacitor electrical failures on DRAM circuits using a wet etch-back to improve the bit-line-to-capacitor overlay margins (2002-08-20),

5. 6433665 - High efficiency thin film inductor (2002-08-13),

6. 6373369 - High efficiency thin film inductor (2002-04-16),

7. 6307213 - Method for making a fuse structure for improved repaired yields on semiconductor memory devices (2001-10-23),

8. 6306767 - Self-aligned etching method for forming high areal density patterned microelectronic structures (2001-10-23),

9. 6287939 - Method for fabricating a shallow trench isolation which is not susceptible to buried contact trench formation (2001-09-11),

10. 6278352 - High efficiency thin film inductor (2001-08-21),

11. 6214715 - Method for fabricating a self aligned contact which eliminates the key hole problem using a two step spacer deposition (2001-04-10),

12. 6207492 - Common gate and salicide word line process for low cost embedded DRAM devices (2001-03-27),

13. 6194234 - Method to evaluate hemisperical grain (HSG) polysilicon surface (2001-02-27),

14. 6187659 - Node process integration technology to improve data retention for logic based embedded dram (2001-02-13),

15. 6174802 - Method for fabricating a self aligned contact which eliminates the key hole problem using a two step contact deposition (2001-01-16),

Title: Innovations in Transparent Electrode Fabrication by Tse-Liang Ying

Introduction

Tse-Liang Ying, a distinguished inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 26 patents, Ying has become a notable figure in the innovation landscape. His latest inventions showcase groundbreaking methods aimed at enhancing the functionality and efficiency of visible light-emitting diodes (LEDs).

Latest Patents

One of Tse-Liang Ying’s most recent patents focuses on a fabrication method of a transparent electrode on visible light-emitting diodes. This innovative method outlines a process where a visible light-emitting diode element, comprising a substrate, an epitaxial structure, and a metal electrode, is utilized. The invention details the formation of an ohmic metal layer on the epitaxial structure's surface, which is subsequently annealed and then removed to expose the epitaxial surface. A transparent electrode layer is then created on this exposed surface, followed by the formation of a metal pad on the transparent electrode layer. This advancement promises to improve the efficiency and performance of visible light-emitting diodes, pushing the boundaries of current technology.

Career Highlights

Tse-Liang Ying has held pivotal roles in reputable companies such as Taiwan Semiconductor Manufacturing Company Ltd. and Epistar Corporation. His work in these organizations contributes significantly to advancements in semiconductor manufacturing and LED technologies. His experience and expertise have been integral in driving forward the research and development needed to innovate in these sectors.

Collaborations

Throughout his career, Tse-Liang Ying has collaborated with several talented professionals, including Wen-Chuan Chiang and Kuo Ching Huang. These partnerships have facilitated the exchange of ideas and fostered an environment ripe for innovation in their respective fields.

Conclusion

Tse-Liang Ying exemplifies the spirit of innovation in semiconductor technology through his extensive patent portfolio and collaborative efforts. His contributions, particularly in the fabrication of transparent electrodes for visible light-emitting diodes, highlight his commitment to enhancing electronic components in everyday technology. As the landscape of semiconductor innovation continues to evolve, the impact of Ying's work will be felt across various applications in the industry.

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