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EPO Patents = 1

Average Co-Inventor Count = 4.2

ph-index = 11

Forward Citations = 349(Granted Patents)

Location History:

Iwakura, JP (1998 - 2005)
Iwakukra, JP (2005)
Nagoya, JP (2005 - 2015)
Kariya, JP (2014 - 2015)

Company Filing History:

Nippondenso Co., Ltd.

where one patent can have more than one assignee

Years Active: 1998-2015

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31 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9034721 - Method for manufacturing semiconductor substrate (2015-05-19),

2. 8956947 - Method for manufacturing semiconductor substrate (2015-02-17),

3. 8936666 - Adsorption agent for noble metal, method for manufacturing the same, and method for recovering noble metal (2015-01-20),

4. 8835276 - Method for manufacturing semiconductor substrate (2014-09-16),

5. 8084011 - Method and apparatus for manufacturing carbon nanotube (2011-12-27),

6. 8023698 - Information device operation apparatus (2011-09-20),

7. 7905090 - Steam engine (2011-03-15),

8. 7855384 - SIC semiconductor device and method for manufacturing the same (2010-12-21),

9. 7799588 - Method of manufacturing the optical device by a stopper to form an oxide block (2010-09-21),

10. 7763504 - Method for manufacturing silicon carbide semiconductor device (2010-07-27),

11. 7732821 - Silicon carbide semiconductor device (2010-06-08),

12. 7532404 - Optical device having micro lens array (2009-05-12),

13. 7493751 - External combustion engine (2009-02-24),

14. 7424802 - Steam engine (2008-09-16),

15. 7355207 - Silicon carbide semiconductor device and method for manufacturing the same (2008-04-08),

Title: Innovator Spotlight - Toshiyuki Morishita: Pioneering Semiconductor Manufacturing in Nagoya

Introduction:

Toshiyuki Morishita, a revered inventor hailing from Nagoya, Japan, has left an indelible mark in the field of semiconductor manufacturing with his groundbreaking innovations. With an impressive portfolio of 31 patents, Morishita continues to revolutionize the industry with his cutting-edge techniques.

Latest Patents:

Morishita's latest patents showcase his prowess in semiconductor substrate manufacturing. One notable invention is the "Method for manufacturing semiconductor substrate," where he devised a novel approach to create alignment marks that ensure precise positioning of components in semiconductor devices. By utilizing trenches and voids effectively, Morishita has simplified the alignment process, resulting in enhanced accuracy in semiconductor apparatus manufacturing.

Career Highlights:

Having worked in prestigious companies such as Denso Corporation and Hitachi, Ltd., Morishita has accumulated a wealth of experience in the semiconductor industry. His journey is marked by a commitment to excellence and a relentless pursuit of innovation, evident in the numerous patents he has secured throughout his career.

Collaborations:

Morishita's collaborative spirit is exemplified through his partnerships with esteemed colleagues such as Tsuyoshi Yamamoto and Shuzo Oda. Together, they have leveraged their expertise to push the boundaries of semiconductor technology, driving the industry forward with their collective ingenuity.

Conclusion:

In conclusion, Toshiyuki Morishita stands as a luminary in the realm of semiconductor manufacturing, with a proven track record of pioneering inventions that have shaped the industry. His relentless dedication to innovation and precision has cemented his legacy as a trailblazer in Nagoya and beyond, inspiring future generations of inventors to push the boundaries of what is possible in the world of semiconductors.

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