Yokohama, Japan

Toshiyo Motozima


Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 1990-1995

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3 patents (USPTO):Explore Patents

Title: The Innovations of Toshiyo Motozima

Introduction

Toshiyo Motozima is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving the manufacturing processes of semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of Motozima's latest patents is a method of manufacturing polycrystalline silicon having a columnar crystalline orientation. This innovation ensures that the polysilicon resistor or electrode formed from a polysilicon film maintains a vertical crystalline orientation relative to the semiconductor substrate. As a result, the variation in grain size due to subsequent heat treatment is minimized, leading to a high uniformity of resistance value. Additionally, the polysilicon film is formed in a groove within the insulating film on the semiconductor substrate, allowing for a flush polysilicon pattern surface. This design prevents unevenness on the surface of the passivation CVD film applied later, ensuring that metal wires formed on it are not cut.

Another significant patent by Motozima is a method of manufacturing a semiconductor device that includes a silicide layer. This process involves forming an insulation film on a silicon substrate and creating a resist film with a specific pattern. An opening is then made in the insulation film using the resist film as a mask. Conductivity-impurity ions are implanted into the silicon substrate, followed by silicon ions, with the resist film again serving as a mask. After removing the resist film, a refractory metal film is formed to cover the opening. The process concludes with the formation of a diffusion layer through annealing, which activates the impurity, and the creation of a silicide layer at the interface of the silicon substrate and the metal film.

Career Highlights

Motozima's career is marked by his dedication to advancing semiconductor technology. His innovative methods have contributed to the efficiency and reliability of semiconductor devices, which are essential in various electronic applications. He is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector.

Collaborations

Throughout his career, Motozima has collaborated with notable colleagues, including Jiro Ohshima and Shin-ichi Taka. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Toshiyo Motozima

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