Toyama, Japan

Toshiro Koshimaki


Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 6(Granted Patents)


Location History:

  • Himishi, JP (2012 - 2014)
  • Toyama, JP (2011 - 2024)

Company Filing History:


Years Active: 2011-2025

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10 patents (USPTO):Explore Patents

Title: Toshiro Koshimaki: Innovator in Semiconductor Processing Technology

Introduction

Toshiro Koshimaki is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 10 patents. His innovative techniques have advanced the technology used in substrate processing and semiconductor manufacturing.

Latest Patents

Koshimaki's latest patents include a method of processing substrates, a substrate processing apparatus, a method of manufacturing semiconductor processing apparatus, and a recording medium. One notable technique involves detecting abnormalities by capturing sound generated from a transfer mechanism operating in a vacuum. This method compares sound information with a preset threshold value to identify any irregularities in the transfer process. The transfer mechanism includes a gas-filled container within the vacuum transfer chamber, equipped with a microphone to facilitate sound detection.

Career Highlights

Throughout his career, Toshiro Koshimaki has worked with leading companies in the semiconductor industry, including Kokusai Electric Corporation and Hitachi Kokusai Electric Inc. His work has been instrumental in developing advanced technologies that enhance the efficiency and reliability of semiconductor devices.

Collaborations

Koshimaki has collaborated with notable colleagues such as Kazuhide Asai and Kayoko Yashiki. These partnerships have contributed to the successful development of innovative solutions in semiconductor processing.

Conclusion

Toshiro Koshimaki's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in substrate processing and semiconductor manufacturing.

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