Chiba, Japan

Toshio Doi


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 30(Granted Patents)


Location History:

  • Chiba, JP (1999 - 2009)
  • Tokyo, JP (2014)

Company Filing History:


Years Active: 1999-2014

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5 patents (USPTO):

Title: **Innovator Toshio Doi: Pioneering Advances in Ion Beam Technology**

Introduction

Toshio Doi, an accomplished inventor from Chiba, Japan, has made significant contributions to the field of ion beam technology. With a total of five patents, his work reflects a deep commitment to innovation, particularly in the area of focused ion beam apparatuses and photomask processing techniques.

Latest Patents

Toshio Doi's latest patents showcase his expertise and novel approaches in engineering. One notable invention is his **Focused Ion Beam Apparatus and Method of Adjusting Ion Beam Optics**. This advanced apparatus includes a control portion capable of storing a condenser voltage table, which is essential for obtaining reference beam currents across various apertures. The process involves calculating and adjusting the condenser voltage based on experimental values, which enhances the effectiveness of ion beam applications.

Another significant patent is the **Method of Correcting Opaque Defect of Photomask Using Atomic Force Microscope Fine Processing Device**. This method involves meticulous scanning techniques utilizing a probe that is harder than the material of the photomask. By alternating scanning modes, Doi’s invention effectively detects and processes opaque defects, ensuring high accuracy and efficiency in photomask manufacturing.

Career Highlights

Throughout his career, Toshio Doi has held positions at reputable companies known for their innovations. His work with Seiko Instruments Inc. and Sii Nanotechnology Inc. has not only advanced his skills but also contributed to the growth of cutting-edge technologies in ion beam applications and nano fabrication.

Collaborations

Toshio Doi has collaborated with talented individuals in the field, including his coworkers Toshiaki Fujii and Yasuhiko Sugiyama. These partnerships have fostered innovative ideas and allowed for the exchange of expertise, thereby enhancing the quality and scope of their inventions.

Conclusion

Toshio Doi stands out as a respected inventor whose advancements in ion beam technology have set new standards in the industry. His patents reflect a deep understanding of scientific principles and a visionary approach to problem-solving. As he continues to innovate, the impact of his work will undoubtedly resonate within the realms of engineering and technology.

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