The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2001
Filed:
Dec. 09, 1998
Applicant:
Inventors:
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/7305 ;
U.S. Cl.
CPC ...
H01J 3/7305 ;
Abstract
A focused ion beam machining method for etching the surface of a sample to obtain a desired profile formation portion by recurrently irradiating a focused ion beam to a desired region of the sample, wherein the recurrently scanned region is enlarged with the elapse of time during the etching and scanning of the sample with the focused ion beam is performed in parallel with the profile formation portion, and the profile formation portion is scanned after all other portions of the recurrently scanned region have been scanned.