Yokohama, Japan

Toshio Asano


Average Co-Inventor Count = 4.8

ph-index = 6

Forward Citations = 132(Granted Patents)


Location History:

  • Hiroshima, JP (2004 - 2007)
  • Yokohama, JP (1986 - 2008)

Company Filing History:


Years Active: 1986-2008

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10 patents (USPTO):

Title: The Innovative Contributions of Toshio Asano

Introduction

Toshio Asano is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of non-destructive inspection methods, holding a total of 10 patents. His work has advanced the techniques used in various industries, particularly in ensuring the integrity of materials and structures.

Latest Patents

Asano's latest patents include a non-destructive inspection method and apparatus that utilizes image signals acquired from a color video camera. This innovative approach allows for the automatic detection of deficiency candidates, including pseudo deficiencies, which are then displayed on a screen for further analysis. The method enhances the accuracy of penetrant inspection and magnetic-particle inspection by distinguishing real deficiencies from false positives. Additionally, his invention incorporates a polarization filter to eliminate regular reflections and an ultraviolet-rays cutting filter to reduce noise during inspections. This dual functionality enables both inspections to be performed using a single probe, streamlining the process.

Career Highlights

Throughout his career, Toshio Asano has worked with notable companies such as Hitachi, Ltd. and Hitachi Ge Nuclear Energy, Ltd. His experience in these organizations has contributed to his expertise in developing advanced inspection technologies.

Collaborations

Asano has collaborated with esteemed colleagues, including Kaoru Sakai and Tetsuo Taguchi. Their combined efforts have furthered the development of innovative solutions in the field of non-destructive testing.

Conclusion

Toshio Asano's contributions to non-destructive inspection methods have significantly impacted various industries. His innovative patents and collaborations with other experts highlight his dedication to advancing technology in this critical area.

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