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Toshimitsu Ohmine

USPTO Granted Patents = 12

Average Co-Inventor Count = 2.3

ph-index = 9

Forward Citations = 1,252(Granted Patents)

Location History:

Tokyo, JP (1990 - 1999)
Tokyo-To, JP (1998 - 1999)
Meguro-Ku, JP (2002)

Company Filing History:

12 out of 52,722

Kabushiki Kaisha Toshiba

Toshiba Kikai Kabushiki Kaisha

where one patent can have more than one assignee

Years Active: 1990-2002

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6365231 - Ammonium halide eliminator, chemical vapor deposition system and chemical vapor deposition process (2002-04-02),

2. 5991508 - Thermal processing apparatus with a shield between heater and substrate (1999-11-23),

3. 5897710 - Substrate processing apparatus and substrate processing method (1999-04-27),

4. 5766360 - Substrate processing apparatus and substrate processing method (1998-06-16),

5. 5527393 - Vapor-phase deposition apparatus and vapor-phase deposition method (1996-06-18),

6. 5474612 - Vapor-phase deposition apparatus and vapor-phase deposition method (1995-12-12),

7. 5230925 - Gas-phase growing method and apparatus for the method (1993-07-27),

8. 5205870 - Vapor deposition apparatus (1993-04-27),

9. 5151133 - Vapor deposition apparatus (1992-09-29),

10. 5088444 - Vapor deposition system (1992-02-18),

11. 5002011 - Vapor deposition apparatus (1991-03-26),

12. 4940213 - Exhaust processing apparatus (1990-07-10),

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